Volume 40, Issue 3-4 p. 561-565
Research Article
Free Access

EIS studies of electrodeposition process of manganese and copper doped ZnO wires

Marian Sima

Corresponding Author

Marian Sima

National Institute of Materials Physics, 77125-Magurele, Romania

National Institute of Materials Physics, 77125-Magurele, Romania.Search for more papers by this author
Ionut Enculescu

Ionut Enculescu

National Institute of Materials Physics, 77125-Magurele, Romania

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Mariana Sima

Mariana Sima

National Institute of Materials Physics, 77125-Magurele, Romania

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Eugen Vasile

Eugen Vasile

METAV-CD, Bucharest, Romania

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Teodor Visan

Teodor Visan

Department of Applied Physical Chemistry & Electrochemistry, POLITEHNICA University, Bucharest, Romania

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First published: 25 January 2008
Citations: 12

Abstract

Electrodeposition of manganese- and copper-doped ZnO wires into polycarbonate membranes, from an aqueous solution containing 0.05 mol dm−3 Zn(NO3)2 + 0.01 mol dm−3 Mn(NO3)2 + 0.0005 mol dm−3 Cu(NO3)2 + 0.0075 mol dm−3 lactic acid, pH = 4.7 was investigated using linear sweep voltammetry and electrochemical impedance spectroscopy (EIS). The equivalent electrical circuits for fitting experimental results were similar to those for characterization of metal/polymer coating systems. Impedance data and voltammetric curves showed that an increase of local pH due to reduction process of nitrate ions induces the co-precipitations of metal ions in the proximity of electrode as oxides. Copyright © 2008 John Wiley & Sons, Ltd.