Volume 42, Issue 12 p. 2085-2088
Research Article

Poly(vinylpyrrolidone)-stabilized silver nanoparticles for strained-silicon surface enhanced Raman spectroscopy

Stuart J. Corr

Corresponding Author

Stuart J. Corr

Nanomaterials Processing Laboratory, (The RINCE Institute), Dublin City University, Dublin 9, Ireland

The Richard E. Smalley Institute for Nanoscale Science and Technology, Rice University, Houston, TX 77005, USA

Nanomaterials Processing Laboratory, (The RINCE Institute), Dublin City University, Dublin 9, Ireland.Search for more papers by this author
Lisa O'Reilly

Lisa O'Reilly

Nanomaterials Processing Laboratory, (The RINCE Institute), Dublin City University, Dublin 9, Ireland

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Eoghan P. Dillon

Eoghan P. Dillon

The Richard E. Smalley Institute for Nanoscale Science and Technology, Rice University, Houston, TX 77005, USA

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Andrew R. Barron

Andrew R. Barron

The Richard E. Smalley Institute for Nanoscale Science and Technology, Rice University, Houston, TX 77005, USA

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Patrick J. McNally

Patrick J. McNally

Nanomaterials Processing Laboratory, (The RINCE Institute), Dublin City University, Dublin 9, Ireland

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First published: 16 June 2011
Citations: 2

Abstract

Poly(vinylpyrrolidone)-stabilized silver nanoparticles deposited onto strained-silicon layers grown on graded Si1−xGex virtual substrates are utilized for selective amplification of the Si–Si vibration mode of strained silicon via surface-enhanced Raman scattering spectroscopy. This solution-based technique allows rapid, highly sensitive and accurate characterization of strained silicon whose Raman signal would usually be overshadowed by the underlying bulk SiGe Raman spectra. The analysis was performed on strained silicon samples of thickness 9, 17.5 and 42 nm using a 488 nm Ar+ micro-Raman excitation source. The quantitative determination of strained-silicon enhancement factors was also made. Copyright © 2011 John Wiley & Sons, Ltd.